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Fabrication techniques for grating-based optical devices AuthorsMichael H. LimThomas E. Murphy, tem@umd.edu Juan Ferrera J. N. Damask Henry I. Smith, hismith@nano.mit.edu AbstractWe describe a novel, versatile process for fabricating integrated Bragg-grating devices. Our process addresses many of the critical challenges presented by such devices, including period selection, alignment, spatial coherence, and nanolithography. Using a combination of e-beam, x-ray, optical, and interference lithographies, we have successfully employed this process to construct 244 nm period, quarter-wave-shifted Bragg gratings on top of 1- mm-tall waveguide structures in InP.Download/View
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