Anisotropically Etched Silicon Surfaces for Planar Plasmonic Terahertz Guided Wave Devices

Published/Posted: June 6, 2014

Authors: Kumar, G.; Li, S.; Jadidi, M. M.; Murphy, T. E.

DOI: 10.1364/CLEO_AT.2014.JW2A.97

Abstract: We report a terahertz waveguide fabricated from doped crystalline silicon. Anisotropic chemically etching is used to produce a periodic array of concave pyramidal troughs in the silicon that provide confinement in both transverse directions.

Citation:
G. Kumar, S. Li, M. M. Jadidi and T. E. Murphy, "Anisotropically Etched Silicon Surfaces for Planar Plasmonic Terahertz Guided Wave Devices", Conference on Lasers and Electrooptics (CLEO), San Jose, CA (USA) JW2A.97 (2014)

Posted in Terahertz